Advance® Vertical Furnace

The Advance Series is a comprehensive range of batch vertical furnaces optimized to meet the needs of advanced semiconductor applications. ASM innovations enable extending processing capabilities as well as reducing cost of ownership.
Advance vertical furnaces feature dual reactor configurations with dual-boat operation that offer the highest productivity in the industry. Injector gas distribution and fast temperature ramping enable the most advanced process performance for a wide range of applications.
The A412 PLUS is designed for 300mm wafers, while the A400 can process 100, 150 or 200mm wafers.

• Dual-reactor configuration for optimum throughput and minimum cost per footprint
• Dual-boat operation for 100% reactor utilization and maximum throughput
• Large Work In Progress (WIP) station for continuous production
• Cluster capability for sequential processing to two reactors
• Nitrogen-purged mini-environments
• Systems accessible from all sides for ease of maintenance
Major Applications
• Oxidation
• Anneal
• Undoped and in-situ (P, As, B) doped polysilicon
• Amorphous silicon
• Poly SiGe
• TEOS
• SiN
• HTO
• Oxynitride
• ALD Al2O3,
• ALD TiN
• Low temperature nitride and oxide